Chemistry is an experimental science, and the best way to enjoy it and learn about it is performing experiments. COA of Formula: C8H12B2F8N4Pd. Introducing a new discovery about 21797-13-7, Name is Tetrakis(acetonitrile)palladium(II) tetrafluoroborate
Pd(II)-catalyzed addition polymerization and ring opening metathesis polymerization of alicyclic monomers: Routes to new matrix resins for 193 nm photolithography
A series of alicyclic polymers designed for 193 nm photoresist applications have been synthesized and characterized. These polymers were synthesized by Pd(II)-catalyzed addition and ring opening metathesis polymerization techniques. Methods for removing residual metal complexes of Pd(II) and Ir(IV) from alicyclic polymers were developed. The low absorbance of these polymers at 193 nm and their high dry etch resistance make them attractive candidates for 193 nm lithography. When formulated with onium-type photoacid generators and plasticizers in propylene glycol monomethyl ether acetate, these photoresists have demonstrated high resolution and high sensitivity.
Note that a catalyst decreases the activation energy for both the forward and the reverse reactions and hence accelerates both the forward and the reverse reactions.COA of Formula: C8H12B2F8N4Pd, you can also check out more blogs about21797-13-7
Reference：
Chapter 1 An introduction to palladium catalysis,
Palladium/carbon catalyst regeneration and mechanical application method